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专利名称：Directed self-assembly of block copolymers
using segmented prepatterns
发明人：Joy Cheng,Kafai Lai,Wai-Kin Li,Young-Hye
Na,Charles Rettner,Daniel P. Sanders
申请号：US12468391申请日：20090519
公开号：US20100294740A1公开日：20101125
专利附图：
摘要：An opening in a substrate is formed, e.g., using optical lithography, with theopening having sidewalls whose cross section is given by segments that are contoured
and convex. The cross section of the opening may be given by overlapping circularregions, for example. The sidewalls adjoin at various points, where they define
protrusions. A layer of polymer including a block copolymer is applied over the openingand the substrate, and allowed to self-assemble. Discrete, segregated domains form inthe opening, which are removed to form holes, which can be transferred into theunderlying substrate. The positions of these domains and their corresponding holes aredirected to predetermined positions by the sidewalls and their associated protrusions.The distances separating these holes may be greater or less than what they would be ifthe block copolymer (and any additives) were to self-assemble in the absence of anysidewalls.
申请人：Joy Cheng,Kafai Lai,Wai-Kin Li,Young-Hye Na,Charles Rettner,Daniel P. Sanders
地址：San Jose CA US,Hopewell Junction NY US,Hopewell Junction NY US,San Jose CAUS,San Jose CA US,San Jose CA US
国籍：US,US,US,US,US,US
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