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Charged particle beam writing apparatus

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专利名称:Charged particle beam writing apparatus发明人:Tetsurou Nishiyama申请号:US12714735申请日:20100301公开号:US08148698B2公开日:20120403

专利附图:

摘要:A blanking deflector is of the coaxial type and includes a rod-like inner

electrode and a cylindrical outer electrode enclosing the inner electrode such that an airgap through which the charged particle beam B passes is formed between the inner andouter electrodes and . The inner electrode and the outer electrode are formed by

forming electrode films and of a metal over the surfaces of nonconducting basematerials and , respectively, by vacuum deposition or sputtering. Further, each of theshaping deflector and the main deflector and sub-deflector for beam scanning includes aplurality of pairs of opposite electrodes, and each opposite electrode is formed byforming an electrode film of a metal over the surface of a nonconducting base materialby vacuum deposition or sputtering.

申请人:Tetsurou Nishiyama

地址:Shizuoka JP

国籍:JP

代理机构:Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.

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