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专利名称：MICRO-STRUCTURE BODY FABRICATION
METHOD, AND MICRO-STRUCTURE BODY
发明人：WATANABE, Junji,KARAI, Masaru申请号：EP13843299.2申请日：20130926公开号：EP2908175A1公开日：20150819
专利附图：
摘要：Provided is a microstructure production method which includes a photoresistpattern forming step and is capable of substantially increasing the number of gradationsof a laser light intensity by a simple method during exposure of a photoresist, to thereby
improve the resolution. The photoresist pattern forming step of irradiating a positivephotoresist applied onto a base material with laser light to expose the photoresist tolight, and developing the photoresist, thereby forming a photoresist pattern having asurface patterned with a concave and convex is carried out. An overlay exposure processin which exposure for modulating an amount of laser light depending on an in-planeposition of the base material is carried out multiple times is performed by settinggradation patterns with different relations between the in-plane position of the basematerial and the amount of laser light, and the concave and convex pattern according toa total amount of exposure in the overlay exposure process is formed after developingthe photoresist.
申请人：Kuraray Co., Ltd.
地址：1621 Sakazu Kurashiki-shi, Okayama 710-0801 JP
国籍：JP
代理机构：Müller-Boré & Partner Patentanwälte PartG mbB
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